Monday, June 1, 2020
Chemical Mechanical Planarization Slurries and Components Thereof
Robert C. Scheinfeld
Baker Botts L.L.P.
Cabot Microelectronics Corporation
Letter to Lisa R. Barton, Secretary, USITC; requesting that the Commission conduct an investigation under section 337 of the Tariff Act of 1930, as amended, regarding certain chemical mechanical planarization slurries and components thereof. The proposed respondents are DuPont de Nemours, Inc., Wilmington, DE; Rohm and Haas Electronic Materials CMP Inc., Newark, DE; Rohm and Haas Electronic Materials CMP Asia Inc. (d/b/a Rohm and Haas Electronic Materials CMP Asia Inc., Taiwan Branch (U.S.A.)), Taiwan; Rohm and Haas Electronic Materials Asia-Pacific Co., Ltd., Taiwan; Rohm and Haas Electronic Materials K.K., Japan; and Rohm and Haas Electronic Materials LLC, Marlborough, MA.